75 citations · 198 across the 8 of their papers we have counts for
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cond-mat.mtrl-sci2017
Atomic Layer Deposition of Cerium Dioxide Film on TiN and Si Substrates: Structural and Chemical Properties
Silvia Vangelista, Rossella Piagge, Satu Ek +3
Cerium dioxide (CeO2) thin films were deposited by atomic layer deposition (ALD) on both Si and TiN substrates. The ALD growth produces CeO2 cubic polycrystalline films on both sub…
cond-mat.mtrl-sci2017★ 75 cited
Structural, Chemical and Optical Properties of Cerium Dioxide Film Prepared by Atomic Layer Deposition on TiN and Si Substrates
S. Vangelista, R. Piagge, S. Ek +4
Thin films of cerium dioxide (CeO2) were deposited by atomic layer deposition (ALD) at 250 °C on both Si and TiN substrates. The ALD growth produces CeO2 films with polycrystalline…