97 citations · 181 across the 5 of their papers we have counts for
5 papers
Extreme ultraviolet lithography reaches 5 nm resolution
Iason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber +2
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development…
Resistless EUV lithography: photon-induced oxide patterning on silicon
Li-Ting Tseng, Prajith Karadan, Dimitrios Kazazis +7
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading litho…
Quantum Hall resistance standards from graphene grown by chemical vapor deposition on silicon carbide
F. Lafont, R. Ribeiro-Palau, D. Kazazis +9
Replacing GaAs by graphene to realize more practical quantum Hall resistance standards (QHRS), accurate to within in relative value, but operating at lower magnetic field…
Magnetoresistance of disordered graphene: from low to high temperatures
B. Jabakhanji, D. Kazazis, W. Desrat +3
We present the magnetoresistance (MR) of highly doped monolayer graphene layers grown by chemical vapor deposition on 6H-SiC. The magnetotransport studies are performed on a large…
Observation of the quantum Hall effect in epitaxial graphene on SiC(0001) with oxygen adsorption
E. Pallecchi, M. Ridene, D. Kazazis +5
In this letter we report on transport measurements of epitaxial graphene on SiC(0001) with oxygen adsorption. In a size Hall bar we observe the half-int…