most citedHydrogen partial pressure as a key parameter in the reactive sputtering of photochromic YHO thin films

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cond-mat.mtrl-sci2026

Substrate-controlled epitaxial-like growth of photochromic yttrium oxyhydride thin films

M. Zubkins, E. Strods, E. Letko +7

Yttrium oxyhydride (YHO) thin films are synthesised by reactive magnetron sputtering of \b{eta}-YHx precursor films onto single-crystalline yttria-stabilised zirconia (YSZ) (111) a…

cond-mat.mtrl-sci2026★ 1 cited

Hydrogen partial pressure as a key parameter in the reactive sputtering of photochromic YHO thin films

E. Strods, M. Zubkins, E. Letko +3

Oxygen-containing yttrium hydride (YHO) thin films were synthesised by reactive magnetron sputtering over a wide range of hydrogen-to-argon gas flow ratios (H2/Ar) during yttrium h…