Substrate-controlled epitaxial-like growth of photochromic yttrium oxyhydride thin films

Abstract

Yttrium oxyhydride (YHO) thin films are synthesised by reactive magnetron sputtering of \b{eta}-YHx precursor films onto single-crystalline yttria-stabilised zirconia (YSZ) (111) and (100) substrates at 200 °C, followed by post-deposition oxidation in air. For comparison, reference films are also prepared on amorphous SiO2 and soda-lime glass substrates at both 200 °C and room temperature (RT). The structural (X-ray diffraction and scanning electron microscopy), compositional (elastic recoil detection analysis), and optical properties, including photochromic behaviour, of the films are systematically investigated. The results reveal a strong influence of substrate orientation on the film microstructure and crystallographic texture, leading to epitaxial-like growth with a mosaic spread of ~3-4°. YHO deposited on YSZ(100) exhibits larger crystallite sizes (10-20 nm) than YHO grown on YSZ(111) (~8 nm) and exhibits residual in-plane compressive strain while remaining largely relaxed with respect to the substrate. Compositional analysis revealed that the O/Y and O/H atomic ratios ranged from 0.71 to 0.82 and from 0.33 to 0.44, respectively, for films deposited under optimised conditions. These films exhibit photochromic behaviour under solar simulator illumination, with relative transmittance changes ranging from 7 to 22 % after 10 min of illumination. Despite the pronounced structural differences, the epitaxial-like films show no systematic improvement in photochromic response, indicating that the effect is governed primarily by composition. The study shows that the bleaching time constant increases exponentially with increasing contrast reached during illumination, rather than representing an intrinsic material constant of YHO.

arXiv comment31 pages, 6 figures

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