B. X. Yu

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20122025

e^{+} e^{-} \to π^{+} π^{-} J / ψ

cross section at center-of-mass energies from 3.77 to 4.60 GeV

264 citations · 1.5k across the 101 of their papers we have counts for

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cs.OH2014

Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session)

Bei Yu, Subhendu Roy, Jhih-Rong Gao +1

Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. Conventional LELELE type TPL technology suffers from native conflict…