B. X. Yu

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20122025

e^{+} e^{-} \to π^{+} π^{-} J / ψ

cross section at center-of-mass energies from 3.77 to 4.60 GeV

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cs.DS2014

Layout Decomposition for Quadruple Patterning Lithography and Beyond

Bei Yu, David Z. Pan

For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patt…