Epitaxial (111) Films of Cu, Ni, and Cu${}_{x}Ni$_y$on\alpha -Al$_2$O$_3$(0001) for Graphene Growth by Chemical Vapor Deposition

David L. Miller, Mark W. Keller, Justin M. Shaw +2

Films of (111)-textured Cu, Ni, and Cu${}_x$Ni${}_y$ were evaluated as substrates for chemical vapor deposition of graphene. A metal thickness of 400 nm to 700 nm was sputtered onto a…