236 citations · 355 across the 6 of their papers we have counts for
6 papers
Emissivity of freestanding membranes with thin metal coatings
P. J. van Zwol, D. F. Vles, W. P. Voorthuijzen +5
Freestanding silicon nitride membranes with thicknesses down to a few tens of nanometers find use as TEM windows or soft X-ray spectral purity filters. As the thickness of a membra…
Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source
A Dolgov, D Lopaev, C J Lee +4
Molecular contamination of a grazing incidence collector for extreme ultraviolet (EUV) lithography was experimentally studied. A carbon film was found to have grown under irradiati…
Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes
A Dolgov, O Yakushev, A Abrikosov +4
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma…
Graphene defect formation by extreme ultraviolet generated photoelectrons
A. Gao, C. J. Lee, F. Bijkerk
We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we…
Model independent X-ray standing wave analysis of periodic multilayer structures
S. N. Yakunin, I. A. Makhotkin, M. A. Chuev +9
We present a model independent approach for the reconstruction of the atomic concentration profile in a nanoscale layered structure, as measured using the X-ray fluorescence yield…
EUV induced defects on few-layer graphene
A. Gao, P. J. Rizo, E. Zoethout +4
We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e. relatively low photon energy, results in an increasing dens…