activity
20132017
most citedTunneling Spectroscopy of Atomically-Thin Al2O3 Films for Tunnel Junctions

47 citations · 123 across the 6 of their papers we have counts for

collaborators
Showing 2014 · cond-mat.mtrl-sciShow all

1 paper · 2 filters

cond-mat.mtrl-sci2014★ 22 cited

Integrating Atomic Layer Deposition and Ultra-High Vacuum Physical Vapor Deposition for In Situ Fabrication of Tunnel Junctions

Alan J. Elliot, Gary A. Malek, Rongtao Lu +4

Atomic Layer Deposition (ALD) is a promising technique for growing ultrathin, pristine dielectrics on metal substrates, which is essential to many electronic devices. Tunnel juncti…