47 citations · 123 across the 6 of their papers we have counts for
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cond-mat.supr-con2014★ 1 cited
Controlling the thickness of Josephson tunnel barriers with atomic layer deposition
Alan J. Elliot, Chunrui Ma, Rongtao Lu +5
Atomic Layer Deposition (ALD) is a promising technique for producing Josephson junctions (JJs) with lower defect densities for qubit applications. A key problem with using ALD for…
cond-mat.mtrl-sci2014★ 22 cited
Integrating Atomic Layer Deposition and Ultra-High Vacuum Physical Vapor Deposition for In Situ Fabrication of Tunnel Junctions
Alan J. Elliot, Gary A. Malek, Rongtao Lu +4
Atomic Layer Deposition (ALD) is a promising technique for growing ultrathin, pristine dielectrics on metal substrates, which is essential to many electronic devices. Tunnel juncti…