most citedFirst principles study of band line up at defective metal-oxide interface: oxygen point defects at Al/SiO_2 interface

22 citations · 41 across the 3 of their papers we have counts for

collaborators

6 papers

cond-mat.mtrl-sci2018

Combined ab initio and empirical model of the thermal conductivity of uranium, uranium-zirconium, and uranium-molybdenum

Shuxiang Zhou, Ryan Jacobs, Wei Xie +3

In this work we developed a practical and general modeling approach for thermal conductivity of metals and metal alloys that integrates ab initio and semiempirical physics-based mo…

cond-mat.mtrl-sci2016★ 1 cited

First principle thermodynamic study of oxygen vacancy at metal/oxide interface

Guanchen Li, Eric Tea, Jianqiu Huang +1

The oxygen vacancy is a crucial intrinsic defect in metal-ultrathin oxide semiconductor heterostructures, and its formation at an interface is of great importance in determining th…

cond-mat.mtrl-sci2016★ 18 cited

Charge carrier transport and lifetimes in n-type and p-type phosphorene as 2D device active materials: an ab initio study

Eric Tea, Celine Hin

In this work, we provide a detailed analysis of phosphorene performance as n-type and p-type active materials. The study is based on first principles calculation of phosphorene ele…

cond-mat.mtrl-sci2016★ 22 cited

First principles study of band line up at defective metal-oxide interface: oxygen point defects at Al/SiO_2 interface

Eric Tea, Jianqiu Huang, Celine Hin

The dielectric breakdown at metal-oxide interfaces is a critical electronic device failure mechanism. Electronic tunneling through dielectric layers is a well-accepted explanation…

cond-mat.mtrl-sci2016

Atomic bonding and electrical potential at metal/oxide interfaces, a first principle study

Eric Tea, Jianqiu Huang, Guanchen Li +1

A number of electronic devices involve metal/oxide interfaces in their structure where the oxide layer plays the role of electrical insulator. As the downscaling of devices continu…

cond-mat.mtrl-sci2016

Hydrogen release at metal-oxide interfaces: A first principle study of hydrogenated Al/SiO interfaces

Jianqiu Huang, Eric Tea, Guanchen Li +1

The Anode Hydrogen Release (AHR) mechanism at interfaces is responsible for the generation of defects, that traps charge carriers and can induce dielectric breakdown in Metal-Oxide…