Hydrogen release at metal-oxide interfaces: A first principle study of hydrogenated Al/SiO${}_2$ interfaces

Abstract

The Anode Hydrogen Release (AHR) mechanism at interfaces is responsible for the generation of defects, that traps charge carriers and can induce dielectric breakdown in Metal-Oxide-Semiconductor Field Effect Transistors. The AHR has been extensively studied at Si/SiO${}_2$ interfaces but its characteristics at metal-silica interfaces remain unclear. In this study, we performed Density Functional Theory (DFT) calculations to study the hydrogen release mechanism at the typical Al/SiO${}_2$ metal-oxide interface. We found that interstitial hydrogen atoms can break interfacial Al-Si bonds, passivating a Si $s{p}^3$ orbital. Interstitial hydrogen atoms can also break interfacial Al-O bonds, or be adsorbed at the interface on aluminum, forming stable Al-H-Al bridges. We showed that hydrogenated O-H, Si-H and Al-H bonds at the Al/SiO${}_2$ interfaces are polarized. The resulting bond dipole weakens the O-H and Si-H bonds, but strengthens the Al-H bond under the application of a positive bias at the metal gate. Our calculations indicate that Al-H bonds and O-H bonds are more important than Si-H bonds for the hydrogen release process.

15 pages, 7 figures, and 1 table