262 citations · 709 across the 9 of their papers we have counts for
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Isaac Childres, Jifa Tian, Ireneusz Miotkowski +1
Plasma etching is an important tool in nano-device fabrication. We report a study on argon plasma etching of topological insulator materials Bi2Se3, Bi2Te3, Sb2Te3 and Bi2Te2Se usi…