most citedChemical Vapor Deposition of Nitrides by Carbon-free Brominated Precursors

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cond-mat.mtrl-sci2026

Delta-Doped Diamond via in-situ Plasma-Distance Control

Philip Schätzle, Felix Hoffmann, Sven Mägdefessel +3

We present an approach for the CVD growth of diamond, where the sample is placed in a defined distance from the reactor baseplate, to which the plasma couples. We observe two previ…

cond-mat.mtrl-sci2025★ 2 cited

Chemical Vapor Deposition of Nitrides by Carbon-free Brominated Precursors

Stefano Leone, Teresa Duarte, Hanspeter Menner +6

The epitaxial growth of group 13-nitride semiconductors (GaN, AlN, and AlGaN alloys) for the mass production and fabrication of high-frequency and high-power devices relies on meta…