collaborators

4 papers

physics.plasm-ph2026

Hybrid simulation of the energy cost of O(D) and O(P) generation in a capacitive Ar/O discharge driven by sawtooth-type voltage waveforms

Jun-Xi Guo, Wan Dong, Yuan-Hong Song

Low-pressure radio-frequency capacitively coupled plasmas operated in Ar/O gas mixtures are widely adopted in critical semiconductor manufacturing processes. O(P) and O($^1…

physics.plasm-ph2026

The effect of surface quenching coefficients of and on capacitively coupled / discharge: A global/equivalent circuit model study

Wan Dong, Yi Wang, Yi-Fan Zhang +1

Capacitively coupled discharges operated in mixtures of and are extensively utilized in plasma etching and deposition processes due to the oxidative properties and precu…

physics.plasm-ph2024

Electron dynamics and SiO2 etching profile evolution in capacitive Ar/CHF3 discharges driven by sawtooth-tailored voltage waveforms

Wan Dong, Liu-Qin Song, Yi-Fan Zhang +3

The electron dynamics and SiO2 etching profile evolution in capacitively coupled Ar/CHF3 plasmas driven by sawtooth-waveforms are investigated based on a one-dimensional fluid/Mont…

physics.plasm-ph2024

Electron dynamics and particle transport in capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms

Wan Dong, Zhuo-Yao Gao, Li Wang +5

One dimensional fluid/electron Monte Carlo simulations of capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms are performed as a function of the number of…