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A. Alberti

5 papers hereh-index 283.2k citations164 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • first author1
  • middle author4

Across the 5 of 5 papers where every author was matched, so the position is known.

fields
  • physics.app-ph3
  • cond-mat.mtrl-sci2
same name
  • A. Alberti — 9 papers, h 28

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

activity
20052020
most citedMorphological and electrical properties of Nickel based Ohmic contacts formed by laser annealing process on n-type 4H-SiC

44 citations · 94 across the 4 of their papers we have counts for

collaborators
Showing physics.app-phShow all

3 papers · 1 filter

physics.app-ph2020★ 18 cited

Inter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealing

Salvatore Sanzaro, Corrado Bongiorno, Paolo Badalà +5

We investigated the complex interaction between a nickel layer and a 4H-SiC substrate under UV-laser irradiation since the early stages of the atomic inter-diffusion. An exhaustive…

physics.app-ph2019★ 22 cited

Properties of Al2O3 thin films deposited on 4H-SiC by reactive ion sputtering

P. Fiorenza, M. Vivona, S. Di Franco +5

In this work, the electrical properties of Al2O3 films deposited by reactive ion sputtering were investigated by means of morphological, chemical and electrical characterizations.…

physics.app-ph2019★ 44 cited

Morphological and electrical properties of Nickel based Ohmic contacts formed by laser annealing process on n-type 4H-SiC

S. Rascunà, P. Badalà, C. Tringali +8

This work reports on the morphological and electrical properties of Ni-based back-side Ohmic contacts formed by laser annealing process for SiC power diodes. Nickel films, 100 nm t…

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