3 papers
cs.LG2026
LLM-Augmented Bayesian Optimization with Adaptive Policies for Chiplet Design Space Exploration
Hang Liu, Zhengfei Chen, Zhengrui Chen +3
Chiplet technology is a key approach for extending Moore's Law. However, its design process is constrained by two primary challenges: the scarcity of early-stage platforms for rapi…
cs.AI2026
VPEvolve: A Self-Evolving Virtual Process Engineer for Computational Lithography
Tianyi Li, Wenxuan Dong, Donger Luo +5
Optical proximity correction (OPC) recipes grow as engineers add local rules to repair newly discovered lithography hotspots. Each correction can interact with existing rules, whil…
cs.LG2025
LMM-IR: Large-Scale Netlist-Aware Multimodal Framework for Static IR-Drop Prediction
Kai Ma, Zhen Wang, Hongquan He +3
Static IR drop analysis is a fundamental and critical task in the field of chip design. Nevertheless, this process can be quite time-consuming, potentially requiring several hours.…