3 papers
physics.app-ph2024
Open-Source Differentiable Lithography Imaging Framework
Guojin Chen, Hao Geng, Bei Yu +1
The rapid evolution of the electronics industry, driven by Moore's law and the proliferation of integrated circuits, has led to significant advancements in modern society, includin…
eess.SP2024
Efficient Bilevel Source Mask Optimization
Guojin Chen, Hongquan He, Peng Xu +2
Resolution Enhancement Techniques (RETs) are critical to meet the demands of advanced technology nodes. Among RETs, Source Mask Optimization (SMO) is pivotal, concurrently optimizi…
cs.LG2019
VLSI Mask Optimization: From Shallow To Deep Learning
Haoyu Yang, Wei Zhong, Yuzhe Ma +4
VLSI mask optimization is one of the most critical stages in manufacturability aware design, which is costly due to the complicated mask optimization and lithography simulation. Re…