Ar/Cl${}_2$ etching of GaAs optomechanical microdisks fabricated with positive electroresist

Rodrigo Benevides, Michaël Ménard, Gustavo S. Wiederhecker +1

A method to fabricate GaAs microcavities using only a soft mask with an electrolithographic pattern in an inductively coupled plasma etching is presented. A careful characterizatio…