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physics.optics2026
Holographic EUV Lithography at 40 nm Resolution
Ziqi Li, Iason Giannopoulos, Lisong Dong +7
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflectiv…
physics.optics2025
Fluorescence intensity correlations enable 3D imaging without sample rotations
Robert G. Radloff, Felix F. Zimmermann, Siqi Li +23
Lensless X-ray imaging provides element-specific nanoscale insights into thick samples beyond the reach of conventional light and electron microscopy. Coherent diffraction imaging…