5 papers
Holographic EUV Lithography at 40 nm Resolution
Ziqi Li, Iason Giannopoulos, Lisong Dong +7
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflectiv…
Fluorescence intensity correlations enable 3D imaging without sample rotations
Robert G. Radloff, Felix F. Zimmermann, Siqi Li +23
Lensless X-ray imaging provides element-specific nanoscale insights into thick samples beyond the reach of conventional light and electron microscopy. Coherent diffraction imaging…
Van der Waals devices for surface-sensitive experiments
Nicolai Taufertshöfer, Corinna Burri, Rok Venturini +11
In-operando characterization of van der Waals (vdW) devices using surface-sensitive methods provides critical insights into phase transitions and correlated electronic states. Yet,…
Imaging of electrically controlled van der Waals layer stacking in 1T-TaS2
Corinna Burri, Nelson Hua, Dario Ferreira Sanchez +16
Van der Waals (vdW) materials exhibit a variety of states that can be switched with low power at low temperatures, offering a viable cryogenic "flash memory" required for the class…
Roadmap on Atomic-scale Semiconductor Devices
Steven R. Schofield, Andrew J. Fisher, Eran Ginossar +47
Spin states in semiconductors provide exceptionally stable and noise-resistant environments for qubits, positioning them as optimal candidates for reliable quantum computing techno…