activity
20082012
most citedFranck-Condon blockade in suspended carbon nanotube quantum dots

309 citations · 517 across the 7 of their papers we have counts for

collaborators

7 papers

cond-mat.supr-con2012★ 42 cited

Temperature-dependence of detection efficiency in NbN and TaN SNSPD

Andreas Engel, Kevin Inderbitzin, Andreas Schilling +7

We present systematic measurements of the temperature-dependence of detection efficiencies in TaN and NbN superconducting nanowire single-photon detectors. We have observed a clear…

cond-mat.supr-con2012★ 18 cited

Soft X-Ray Single-Photon Detection With Superconducting Tantalum Nitride and Niobium Nanowires

Kevin Inderbitzin, Andreas Engel, Andreas Schilling

We have fabricated ultrafast dark count-free soft X-ray single-photon detectors (X-SNSPDs) from TaN with various conduction path widths, and we compare their properties with corres…

cond-mat.supr-con2012★ 39 cited

An ultra-fast superconducting Nb nanowire single-photon detector for soft X-rays

Kevin Inderbitzin, Andreas Engel, Andreas Schilling +2

Although superconducting nanowire single-photon detectors (SNSPDs) are well studied regarding the detection of infrared/optical photons and keV-molecules, no studies on continuous…

cond-mat.supr-con2011★ 100 cited

Tantalum nitride superconducting single-photon detectors with low cut-off energy

Andreas Engel, Adrian Aeschbacher, Kevin Inderbitzin +6

Materials with a small superconducting energy gap are expected to favor a high detection efficiency of low-energy photons in superconducting nanowire single-photon detectors. We de…

cond-mat.mes-hall2010

Symbiotic Optimization of the Nanolithography and RF-Plasma Etching for Fabricating High-Quality Light-Sensitive Superconductors on the 50 nm Scale

H. Bartolf, K. Inderbitzin, L. B. Gómez +6

We present results of a fabrication-process development for the lithographic pattern transfer into the sub-100nm range by combining electron-beam lithography and reactive dry etchi…

cond-mat.mes-hall2010★ 9 cited

Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication

H. Bartolf, K. Inderbitzin, L. B. Gómez +2

We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive…