2 papers
cond-mat.mtrl-sci2026
Interlayer-mediated catalyst engineering for ultra-high aspect ratio silicon nanostructures
Bryan Peter Jost Benz, Marco Stampanoni, Lucia Romano
Reliable and precise etching of silicon nanostructures with ultra-high aspect ratios is required in many fields. Metal assisted chemical etching (MacEtch) in vapor is a plasma-free…
physics.app-ph2022
High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch
Z. Shi, K. Jefimovs, M. Stampanoni +1
Structuring Si in arrays of vertical high aspect ratio pillars, ranging from nanoscale to macroscale feature dimensions, is essential for producing functional interfaces for many a…