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Non-invasive monitoring of process-relevant plasma parameters by Fiber PROES in capacitively coupled Ar/CF plasmas
Florian Beckfeld, Maximilian Ryppa, Constantin Neuroth +3
Monitoring changes of process-relevant plasma parameters, such as the electron density and ion flux to the wafer, is essential for the development and control of plasma processes.…
Electron dynamics and SiO2 etching profile evolution in capacitive Ar/CHF3 discharges driven by sawtooth-tailored voltage waveforms
Wan Dong, Liu-Qin Song, Yi-Fan Zhang +3
The electron dynamics and SiO2 etching profile evolution in capacitively coupled Ar/CHF3 plasmas driven by sawtooth-waveforms are investigated based on a one-dimensional fluid/Mont…
Electron dynamics and particle transport in capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms
Wan Dong, Zhuo-Yao Gao, Li Wang +5
One dimensional fluid/electron Monte Carlo simulations of capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms are performed as a function of the number of…