Atomic layer etching of SiO${}_2$ using sequential exposures of Al(CH${}_3$)${}_3$ and H${}_2$/SF${}_6$ plasma

David Catherall, Azmain Hossain, Austin Minnich

On-chip photonic devices based on SiO${}_2$ are of interest for applications such as microresonator gyroscopes and microwave sources. Although SiO${}_2$ microdisk resonators have achie…