10 citations · 20 across the 5 of their papers we have counts for
3 papers · 1 filter
More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography
Fabian Holzmeier, Michiel J. van Setten, Ragnar Björnsson +3
Pentafluorophenyl triflate has been explored as a highly absorbing neutral photoacid generator (PAG) candidate for next generation chemically amplified resists used in extreme ultr…
Two-colour coherent control of nuclear and electron dynamics in photoionization of molecular hydrogen with FEL pulses
Fabian Holzmeier, Alberto Gonzalez-Castrillo, Thomas M. Baumann +12
The extension of coherent - control schemes, recently implemented in free-electron lasers (FELs), to molecular systems offers new opportunities to control chemical dynamics…
Photoemission Spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials
Faegheh S. Sajjadian, Laura Galleni, Kevin M. Dorney +5
Device architectures and dimensions are now at an unimaginable level not thought possible even 10 years ago. The continued downscaling, following the so-called Moore's law, has mot…