10 citations · 13 across the 3 of their papers we have counts for
3 papers
Two-colour coherent control of nuclear and electron dynamics in photoionization of molecular hydrogen with FEL pulses
Fabian Holzmeier, Alberto Gonzalez-Castrillo, Thomas M. Baumann +12
The extension of coherent - control schemes, recently implemented in free-electron lasers (FELs), to molecular systems offers new opportunities to control chemical dynamics…
Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists
Kevin M. Dorney, Ivan Pollentier, Fabian Holzmeier +11
Metal oxide resists (MORs) have shown great promise for high resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high volume manufac…
Dissociative photoionization of EUV lithography photoresist models
Marziogiuseppe Gentile, Marius Gerlach, Robert Richter +4
The dissociative photoionization of \textit{tert}-butyl methyl methacrylate, a monomer unit found in many ESCAP resists, was investigated in a gas phase photoelectron photoion coin…