Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication

H. Bartolf, K. Inderbitzin, L. B. Gómez +2

We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive…