The effect of surface quenching coefficients of $O_2(a^1\Delta g)$ and $O_2(b^1\Sigma g^{+})$ on capacitively coupled $Ar$/$O_2$ discharge: A global/equivalent circuit model study

Wan Dong, Yi Wang, Yi-Fan Zhang +1

Capacitively coupled discharges operated in mixtures of $Ar$ and $O_2$ are extensively utilized in plasma etching and deposition processes due to the oxidative properties and precu…