activity
20122026
most citedOrigin of High Temperature Oxidation Resistance of Ti-Al-Ta-N Coatings

114 citations · 165 across the 6 of their papers we have counts for

collaborators

6 papers

cond-mat.mtrl-sci2026

Impact of O concentration on the thermal stability and decomposition mechanism of (Cr,Al)N compared to (Ti,Al)N thin films

Pauline Kümmerl, Ganesh Kumar Nayak, Felix Leinenbach +6

The composition-dependent thermal stability of (CrAl)(ON) thin films with O concentrations of y = 0, 0.15, and 0.40…

physics.plasm-ph2015★ 12 cited

Erosion behaviour of composite Al-Cr cathodes in cathodic arc plasmas in inert and reactive atmospheres

Robert Franz, Francisca Mendez Martin, Gerhard Hawranek +1

AlCr composite cathodes with Al contents of x = 0.75, 0.5 and 0.25 were exposed to cathodic arc plasmas in Ar, N and O atmospheres and their erosion behaviour…

physics.plasm-ph2014★ 21 cited

Element- and charge-state-resolved ion energies in the cathodic arc plasma from composite AlCr cathodes in argon, nitrogen and oxygen atmospheres

Robert Franz, Peter Polcik, André Anders

The energy distribution functions of ions in the cathodic arc plasma using composite AlCr cathodes were measured as a function of the background gas pressure in the range 0.5 to 3.…

cond-mat.mtrl-sci2014

Complementary ab initio and X-ray nano-diffraction study of Ta2O5

R. Hollerweger, D. Holec, J. Paulitsch +7

Numerous different crystal structures of Ta2O5 are reported in literature. Although experimentally and computationally obtained lattice parameters and mechanical properties are in…

cond-mat.mtrl-sci2014★ 114 cited

Origin of High Temperature Oxidation Resistance of Ti-Al-Ta-N Coatings

R. Hollerweger, H. Riedl, J. Paulitsch +5

Alloying Ti-Al-N coatings with Ta has proven to enhance their hardness, thermal stability, and oxidation resistance. However, especially for arc-evaporated Ti-Al-Ta-N coatings only…

cond-mat.mtrl-sci2012★ 18 cited

Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5

R. Hollerweger, D. Holec, J. Paulitsch +3

Reactive magnetron sputtering enables the deposition of various thin films to be used for protective as well as optical and electronic applications. However, progressing target ero…