64 citations · 68 across the 9 of their papers we have counts for
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Auger parameter analysis for TiN and AlN thin films via combined in-situ XPS and HAXPES
O. V. Pshyk, J. Patidar, C. Cancellieri +1
Auger parameter analysis provides in-depth information about the electronic and chemical bonding properties of TiN and AlN thin films, which are relevant across a wide range of tec…
opXRD: Open Experimental Powder X-ray Diffraction Database
Daniel Hollarek, Henrik Schopmans, Jona Östreicher +21
Powder X-ray diffraction (pXRD) experiments are a cornerstone for materials structure characterization. Despite their widespread application, analyzing pXRD diffractograms still pr…
Reducing the oxygen contamination in conductive (Ti,Zr)N coatings via RF-bias assisted reactive sputtering
K. Thorwarth, M. Watroba, O. Pshyk +6
Ternary transition metal nitride coatings are promising for many applications as they can offer improved hardness and oxidation resistance compared to binary counterparts. A common…
Beyond structural stabilization of highly-textured AlN thin film: the role of chemical effects
O. V. Pshyk, J. Patidar, S. Siol
The crystalline quality and degree of c-axis orientation of hexagonal AlN thin films correlate directly with their functional properties. Therefore, achieving AlN thin films of hig…
Advanced chemical state studies of oxide films by lab-based HAXPES combining soft and hard X-ray sources
S. Siol, J. Mann, J. Newman +5
The greater information depth provided in Hard X-ray Photoelectron Spectroscopy (HAXPES) enables non-destructive analyses of the chemistry and electronic structure of buried interf…