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physics.app-ph2026
Sub-Micron Gate FinFETs with Current Density 750 mA/mm and Ion/Ioff Ratio
Nabasindhu Das, Cameron Gorsak, Pushpanshu Tripathi +7
In this work, we demonstrate submicron-gate FinFETs that integrate Si delta-doped channels with selectively regrown n++ source/drain contacts. The devices employ 10…
cond-mat.mtrl-sci2026
Modulation-Doped Field-Effect Transistors with 6 kV Breakdown
Julian Gervassi Saga, Joshua T Buontempo, Nabasindhu Das +3
modulation-doped field-effect transistors (MODFETs) incorporating a high-quality Al2O3 gate dielectric and SiNx passivation are demonstrate…
physics.app-ph2026
Temperature Dependent Characteristics of Quasi-vertical AlN Schottky Diodes on Bulk AlN Substrate
Md Abdul Hamid, Nabasindhu Das, Advait Gilankar +3
We report on the fabrication and temperature-dependent characterization of MOCVD-grown quasi-vertical AlN Schottky barrier diodes (SBDs) on bulk AlN substrates. The SBDs exhibited…