13 citations · 24 across the 3 of their papers we have counts for
1 paper · 1 filter
S. Boisseau, A. B. Duret, G. Despesse +3
This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electr…