2 citations · 4 across the 11 of their papers we have counts for
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Advancing SEM Based Nano-Scale Defect Analysis in Semiconductor Manufacturing for Advanced IC Nodes
Bappaditya Dey, Matthias Monden, Victor Blanco +2
In this research, we introduce a unified end-to-end Automated Defect Classification-Detection-Segmentation (ADCDS) framework for classifying, detecting, and segmenting multiple ins…
An Evaluation of Continual Learning for Advanced Node Semiconductor Defect Inspection
Amit Prasad, Bappaditya Dey, Victor Blanco +1
Deep learning-based semiconductor defect inspection has gained traction in recent years, offering a powerful and versatile approach that provides high accuracy, adaptability, and e…
Addressing Class Imbalance and Data Limitations in Advanced Node Semiconductor Defect Inspection: A Generative Approach for SEM Images
Bappaditya Dey, Vic De Ridder, Victor Blanco +2
Precision in identifying nanometer-scale device-killer defects is crucial in both semiconductor research and development as well as in production processes. The effectiveness of ex…
Towards Improved Semiconductor Defect Inspection for high-NA EUVL based on SEMI-SuperYOLO-NAS
Ying-Lin Chen, Jacob Deforce, Vic De Ridder +4
Due to potential pitch reduction, the semiconductor industry is adopting High-NA EUVL technology. However, its low depth of focus presents challenges for High Volume Manufacturing.…
Improved Defect Detection and Classification Method for Advanced IC Nodes by Using Slicing Aided Hyper Inference with Refinement Strategy
Vic De Ridder, Bappaditya Dey, Victor Blanco +2
In semiconductor manufacturing, lithography has often been the manufacturing step defining the smallest possible pattern dimensions. In recent years, progress has been made towards…
Benchmarking Feature Extractors for Reinforcement Learning-Based Semiconductor Defect Localization
Enrique Dehaerne, Bappaditya Dey, Sandip Halder +1
As semiconductor patterning dimensions shrink, more advanced Scanning Electron Microscopy (SEM) image-based defect inspection techniques are needed. Recently, many Machine Learning…
Deep learning denoiser assisted roughness measurements extraction from thin resists with low Signal-to-Noise Ratio(SNR) SEM images: analysis with SMILE
Sara Sacchi, Bappaditya Dey, Iacopo Mochi +2
The technological advance of High Numerical Aperture Extreme Ultraviolet Lithography (High NA EUVL) has opened the gates to extensive researches on thinner photoresists (below 30nm…