2 citations · 3 across the 3 of their papers we have counts for
3 papers
cs.CV2023★ 2 cited
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Guojin Chen, Zehua Pei, Haoyu Yang +3
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates…
cs.AI2023
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition
Guojin Chen, Haoyu Yang, Bei Yu
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of…
cs.CV2023★ 1 cited
AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns
Wenqian Zhao, Xufeng Yao, Ziyang Yu +4
Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine…