31 citations · 40 across the 15 of their papers we have counts for
16 papers
LithoGRPO: Fast Inverse Lithography via GRPO Reinforced Flow Matching
Yao Lai, Xuyuan Xiong, Zeyue Xue +7
In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask. As circuit features shrink below the wavelength of light, optical…
AnalogCoder-Pro: Unifying Analog Circuit Generation and Optimization via Multi-modal LLMs
Yao Lai, Souradip Poddar, Sungyoung Lee +5
Despite recent advances, analog front-end design still relies heavily on expert intuition and iterative simulations, which limits the potential for automation. We present AnalogCod…
DiffPattern-Flex: Efficient Layout Pattern Generation via Discrete Diffusion
Zixiao Wang, Wenqian Zhao, Yunheng Shen +4
Recent advancements in layout pattern generation have been dominated by deep generative models. However, relying solely on neural networks for legality guarantees raises concerns i…
PACE: Pacing Operator Learning to Accurate Optical Field Simulation for Complicated Photonic Devices
Hanqing Zhu, Wenyan Cong, Guojin Chen +4
Electromagnetic field simulation is central to designing, optimizing, and validating photonic devices and circuits. However, costly computation associated with numerical simulation…
Open-Source Differentiable Lithography Imaging Framework
Guojin Chen, Hao Geng, Bei Yu +1
The rapid evolution of the electronics industry, driven by Moore's law and the proliferation of integrated circuits, has led to significant advancements in modern society, includin…
Differentiable Edge-based OPC
Guojin Chen, Haoyu Yang, Haoxing Ren +2
Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based…
Intelligent OPC Engineer Assistant for Semiconductor Manufacturing
Guojin Chen, Haoyu Yang, Bei Yu +1
Advancements in chip design and manufacturing have enabled the processing of complex tasks such as deep learning and natural language processing, paving the way for the development…
LLM-Enhanced Bayesian Optimization for Efficient Analog Layout Constraint Generation
Guojin Chen, Keren Zhu, Seunggeun Kim +4
Analog layout synthesis faces significant challenges due to its dependence on manual processes, considerable time requirements, and performance instability. Current Bayesian Optimi…
AnalogCoder: Analog Circuit Design via Training-Free Code Generation
Yao Lai, Sungyoung Lee, Guojin Chen +4
Analog circuit design is a significant task in modern chip technology, focusing on the selection of component types, connectivity, and parameters to ensure proper circuit functiona…
Efficient Bilevel Source Mask Optimization
Guojin Chen, Hongquan He, Peng Xu +2
Resolution Enhancement Techniques (RETs) are critical to meet the demands of advanced technology nodes. Among RETs, Source Mask Optimization (SMO) is pivotal, concurrently optimizi…
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Guojin Chen, Zehua Pei, Haoyu Yang +3
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates…
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition
Guojin Chen, Haoyu Yang, Bei Yu
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of…
DiffPattern: Layout Pattern Generation via Discrete Diffusion
Zixiao Wang, Yunheng Shen, Wenqian Zhao +4
Deep generative models dominate the existing literature in layout pattern generation. However, leaving the guarantee of legality to an inexplicable neural network could be problema…
DevelSet: Deep Neural Level Set for Instant Mask Optimization
Guojin Chen, Ziyang Yu, Hongduo Liu +2
With the feature size continuously shrinking in advanced technology nodes, mask optimization is increasingly crucial in the conventional design flow, accompanied by an explosive gr…
AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns
Wenqian Zhao, Xufeng Yao, Ziyang Yu +4
Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine…
DAMO: Deep Agile Mask Optimization for Full Chip Scale
Guojin Chen, Wanli Chen, Yuzhe Ma +2
Continuous scaling of the VLSI system leaves a great challenge on manufacturing and optical proximity correction (OPC) is widely applied in conventional design flow for manufactura…