31 citations · 40 across the 15 of their papers we have counts for
5 papers · 1 filter
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Guojin Chen, Zehua Pei, Haoyu Yang +3
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates…
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition
Guojin Chen, Haoyu Yang, Bei Yu
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of…
DiffPattern: Layout Pattern Generation via Discrete Diffusion
Zixiao Wang, Yunheng Shen, Wenqian Zhao +4
Deep generative models dominate the existing literature in layout pattern generation. However, leaving the guarantee of legality to an inexplicable neural network could be problema…
DevelSet: Deep Neural Level Set for Instant Mask Optimization
Guojin Chen, Ziyang Yu, Hongduo Liu +2
With the feature size continuously shrinking in advanced technology nodes, mask optimization is increasingly crucial in the conventional design flow, accompanied by an explosive gr…
AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns
Wenqian Zhao, Xufeng Yao, Ziyang Yu +4
Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine…