8 citations · 15 across the 4 of their papers we have counts for
4 papers
Atomistic insights into ultrafast SiGe nanoprocessing
Gaetano Calogero, Domenica Raciti, Damiano Ricciarelli +9
Controlling ultrafast material transformations with atomic precision is essential for future nanotechnology. Pulsed laser annealing (LA), inducing extremely rapid and localized pha…
Impact of surface reflectivity on the ultra-fast laser melting of silicon-germanium alloys
Damiano Ricciarelli, Giovanni Mannino, Ioannis Deretzis +10
Ultraviolet nanosecond laser annealing (LA) is a powerful tool where strongly confined heating and melting are desirable. In semiconductor technologies the importance of LA increas…
Infrared nanoplasmonic properties of hyperdoped embedded Si nanocrystals in the few electrons regime
Meiling Zhang, Jean-Marie Poumirol, Nicolas Chery +13
Using Localized Surface Plasmon Resonance (LSPR) as an optical probe we demonstrate the presence of free carriers in phosphorus doped silicon nanocrystals (SiNCs) embedded in a sil…
Failure Mode Analysis in Microsecond UV Laser Annealing of Cu Thin Films
Remi Demoulin, Richard Daubriac, Louis Thuries +5
The need of surface-localized thermal processing is strongly increasing especially w.r.t three-dimensionally (3D) integrated electrical devices. UV laser annealing (UV-LA) technolo…