most citedRecent Progresses and Perspectives of UV Laser Annealing Technologies for Advanced CMOS Devices

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cond-mat.mtrl-sci2025

Impact of impurities on leakage current induced by High-Energy Density Pulsed Laser Annealing in Si diodes

Richard Monflier, Richard Daubriac, Mahmoud Haned +9

For semiconductor device fabrication, Pulsed Laser Annealing (PLA) offers significant advantages over conventional thermal processes. Notably, it can provide ultrafast (~ns) and hi…