Thermal and Oxidation Stability of Ti${}_x$W${}_{1-x}$ Diffusion Barriers Investigated by Soft and Hard X-ray Photoelectron Spectroscopy

Curran Kalha, Sebastian Bichelmaier, Nathalie K. Fernando +10

The binary alloy of titanium-tungsten (TiW) is an established diffusion barrier in high-power semiconductor devices, owing to its ability to suppress the diffusion of copper from t…