Isotropic plasma-thermal atomic layer etching of superconducting TiN films using sequential exposures of molecular oxygen and SF${}_6/$H${}_2$ plasma

Azmain A. Hossain, Haozhe Wang, David S. Catherall +4

Microwave loss in superconducting titanium nitride (TiN) films is attributed to two-level systems in various interfaces arising in part from oxidation and microfabrication-induced…