paper

Surface zeta potential and diamond growth on gallium oxide single crystal

arXiv:2104.01048 · doi:10.1016/j.carbon.2021.04.100

Abstract

In this work a strategy to grow diamond on -GaO has been presented. The -potential of the -GaO substrate was measured and it was found to be negative with an isoelectric point at pH 4.6. The substrates were seeded with mono-dispersed diamond solution for growth of diamond. The seeded substrates were etched when exposed to diamond growth plasma and globules of gallium could be seen on the surface. To overcome the problem 100 nm of SiO and AlO were deposited using atomic layer deposition. The nanodiamond seeded SiO layer was effective in protecting the -GaO substrate and thin diamond layers could be grown. In contrast AlO layers were damaged when exposed to diamond growth plasma. The thin diamond layers were characterised with scanning electron microscopy and Raman spectroscopy. Raman spectroscopy revealed the diamond layer to be under compressive stress of 1.3 -- 2.8GPa.

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