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physics.plasm-ph2025
Deposition rate and energy to substrate in chopped and standard HiPIMS: identifying optimal pulse parameters
Mina Farahani, JiÅà Äapek, Tomáš Kozák
High-Power Impulse Magnetron Sputtering (HiPIMS) offers higher ionized flux fractions at the cost of lower deposition rates compared to conventional DCMS. A fine optimization of th…
physics.plasm-ph2024
On unipolar and bipolar HiPIMS pulse configurations to enhance energy flux to insulating surfaces
M. Farahani, T. Kozák, A. D. Pajdarová +2
High-power impulse magnetron sputtering (HiPIMS) delivers a high target power in short pulses, enhancing the ionization and energy of sputtered atoms and providing thus more possib…
physics.plasm-ph2024
Effect of magnetic field configuration on double layer formation and reverse discharge ignition in bipolar HiPIMS
M. Farahani, T. Kozák, A. D. Pajdarová +1
The reverse discharge (RD) phenomenon in bipolar HiPIMS has been observed when a sufficiently long positive pulse is applied to the magnetron. Due to the magnetic field, electrons…