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20212025
most citedCMOS-compatible Strain Engineering for High-Performance Monolayer Semiconductor Transistors

59 citations · 138 across the 4 of their papers we have counts for

collaborators

5 papers

cond-mat.mtrl-sci2025

Low Resistance P-type Contacts to Monolayer WSe through Chlorinated Solvent Doping

Lauren Hoang, Robert K. A. Bennett, Anh Tuan Hoang +7

Tungsten diselenide (WSe) is a promising p-type semiconductor limited by high contact resistance () and the lack of a reliable doping strategy. Here, we demonstra…

cond-mat.mtrl-sci2024

Direct X-Ray Measurements of Strain in Monolayer MoS from Capping Layers and Geometrical Features

Kathryn Neilson, Marc Jaikissoon, Dante Zakhidov +4

Strain induced through fabrication, both by patterning and capping, can be used to change the properties of two-dimensional (2D) materials or other thin films. Here, we explore how…

physics.app-ph2024★ 59 cited

CMOS-compatible Strain Engineering for High-Performance Monolayer Semiconductor Transistors

Marc Jaikissoon, Çağıl Köroğlu, Jerry A. Yang +3

Strain engineering has played a key role in modern silicon electronics, having been introduced as a mobility booster in the 1990s and commercialized in the early 2000s. Achieving s…

cond-mat.mtrl-sci2022★ 34 cited

Imaging the electron charge density in monolayer MoS2 at the Ångstrom scale

Joel Martis, Sandhya Susarla, Archith Rayabharam +15

Four-dimensional scanning transmission electron microscopy (4D-STEM) has recently gained widespread attention for its ability to image atomic electric fields with sub-Ångstrom spat…

physics.app-ph2021★ 45 cited

Toward Low-Temperature Solid-Source Synthesis of Monolayer MoS2

Alvin Tang, Aravindh Kumar, Marc Jaikissoon +3

Two-dimensional (2D) semiconductors have been proposed for heterogeneous integration with existing silicon technology; however, their chemical vapor deposition (CVD) growth tempera…