5 papers · 1 filter
Characterization of ultrathin nickel films deposited by thermal laser evaporation
David S. Catherall, Yifei Yan, Finley B. Donachie +2
Thermal laser evaporation is a physical vapor deposition technique of increasing interest because of its ability to evaporate essentially any solid element, even the most refractor…
Directional atomic layer etching of MgO-doped lithium niobate using Br-based plasma
Ivy I. Chen, Mariya Ezzy, Emily Hsue-Chi Shi +8
Lithium niobate (LiNbO, LN) is a nonlinear optical material of high interest for integrated photonics with applications ranging from optical communications to quantum informati…
Atomic layer etching of InGaAs using sequential exposures of atomic hydrogen and oxygen gas
Mete M. Bayrak, Anthony J. Ardizzi, Sadhvikas Addamane +2
The high frequency performance and yield of III-V semiconductor devices such as InP HEMTs is negatively impacted by subsurface etch damage and non-uniform etch depth over the wafer…
Atomic layer etching of niobium nitride using sequential exposures of O and H/SF plasmas
Azmain A. Hossain, Sela Murphy, David S. Catherall +2
Niobium nitride (NbN) is a metallic superconductor that is widely used for superconducting electronics due to its high transition temperature () and kinetic inductance. Proces…
Valleytronics and negative differential resistance in cubic boron nitride: a first-principles study
Benjamin Hatanpää, Austin J. Minnich
Cubic boron nitride (c-BN) is an ultrawide-bandgap semiconductor of significant interest for high-frequency and high-power electronics applications owing to its high saturation dri…