13 citations · 35 across the 5 of their papers we have counts for
5 papers
Nanometer resolution mask lithography with matter waves: Near-field binary holography
Torstein Nesse, Ingve Simonsen, Bodil Holst
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano…
The scattering of a scalar beam from isotropic and anisotropic two-dimensional randomly rough Dirichlet or Neumann surfaces: The full angular intensity distributions
Torstein Storflor Hegge, Torstein Nesse, Alexei A. Maradudin +1
By the use of Green's second integral identity we determine the field scattered from a two-dimensional randomly rough isotropic or anisotropic Dirichlet or Neumann surface when it…
Wave scattering from two-dimensional self-affine Dirichlet and Neumann surfaces and its application to the retrieval of self-affine parameters
Daniel Strand, Torstein Nesse, Jacob B. Kryvi +2
Wave scattering from two-dimensional self-affine Dirichlet and Neumann surfaces is studied for the purpose of using the intensity scattered from them to obtain the Hurst exponent a…
On the optimal design of grid-based binary holograms for matter wave lithography
Torstein Nesse, Jean-Philippe Banon, Bodil Holst +1
Grid based binary holography (GBH) is an attractive method for patterning with light or matter waves. It is an approximate technique in which different holographic masks can be use…
Neutral Helium Atom Diffraction from a Micron Scale Periodic Structure: Photonic Crystal Membrane Characterization
Torstein Nesse, Sabrina D. Eder, Thomas Kaltenbacher +3
Surface scattering of neutral helium beams created by supersonic expansion is an established technique for measuring structural and dynamical properties of surfaces on the atomic s…