13 citations · 69 across the 13 of their papers we have counts for
5 papers · 1 filter
Atom binary holography at a finite distance: Resolution, contrast and flux
Veronica P. Simonsen, Bodil Holst, Ingve Simonsen
In classical binary holography, a target pattern located at infinity is generated by the diffraction of a plane wave passing through a binary mask with holes of the same size, plac…
Observation of increasing bending rigidity of graphene with temperature
Martin Tømterud, Simen K. Hellner, Sabrina D. Eder +6
The mechanical properties of two-dimensional materials are important for a wide range of applications including composite and van der Waals-materials, flexible electronics and supe…
Realistic mask generation for matter-wave lithography via machine learning
Johannes Fiedler, Adrià Salvador Palau, Eivind Kristen Osestad +2
Fast production of large area patterns with nanometre resolution is crucial for the established semiconductor industry and for enabling industrial-scale production of next-generati…
Observation of the Boson Peak in a 2D Material
Martin Tømterud, Sabrina D. Eder, Christin Büchner +5
The boson peak is an excess in the phonon density of states relative to the Debye Model, which occurs at frequencies below the Debye limit. It is present in most amorphous material…
An atom passing through a hole in a dielectric membrane: Impact of dispersion forces on mask-based matter-wave lithography
Johannes Fiedler, Bodil Holst
Fast, large area patterning of arbitrary structures down to the nanometre scale is of great interest for a range of applications including the semiconductor industry, quantum elect…