K. Dwyer

activity

20182022

_{3}

for acceptor delta-doping of silicon

4 citations · 4 across the 1 of their papers we have counts for

collaborators

4 papers

cond-mat.mtrl-sci2022★ 4 cited

Reaction pathways of BCl $_{3}$ for acceptor delta-doping of silicon

Quinn Campbell, Kevin J. Dwyer, Sungha Baek +3

BCl $_{3}$ is a promising candidate for atomic-precision acceptor doping in Si, but optimizing the electrical properties of structures created with this technique requires a detailed…

cond-mat.mtrl-sci2021

Area-selective deposition and B $δ$ -doping of Si(100) with BCl $_{3}$

K. J. Dwyer, S. Baek, Azadeh Farzaneh +3

B-doped $δ$ -layers were fabricated in Si(100) using BCl $_{3}$ as a dopant precursor in ultrahigh vacuum. BCl $_{3}$ adsorbed readily at room temperature, as revealed by scanning tun…

cond-mat.mtrl-sci2021

AlCl $_{3}$ -dosed Si(100)-2 $\times$ 1: Adsorbates, chlorinated Al chains, and incorporated Al

Matthew S. Radue, Sungha Baek, Azadeh Farzaneh +8

The adsorption of AlCl $_{3}$ on Si(100) and the effect of annealing the AlCl $_{3}$ -dosed substrate was studied to reveal key surface processes for the development of atomic-precisi…

cond-mat.mes-hall2018

STM-induced desorption and lithographic patterning of Cl-Si(100)-(2x1)

K. J Dwyer, Michael Dreyer, R. E. Butera

We investigated STM-induced chlorine desorption and lithographic patterning of Cl-terminated Si(100)-(2x1) surfaces at sample temperatures from 4 K to 600 K. STM lithography has pr…

Reaction pathways of BCl3​ for acceptor delta-doping of silicon

Area-selective deposition and B δ-doping of Si(100) with BCl3​

AlCl3​-dosed Si(100)-2×1: Adsorbates, chlorinated Al chains, and incorporated Al

STM-induced desorption and lithographic patterning of Cl-Si(100)-(2x1)

Reaction pathways of BCl $_{3}$ for acceptor delta-doping of silicon

Area-selective deposition and B $δ$ -doping of Si(100) with BCl $_{3}$

AlCl $_{3}$ -dosed Si(100)-2 $\times$ 1: Adsorbates, chlorinated Al chains, and incorporated Al