activity
20112019
most citedComparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

47 citations · 75 across the 7 of their papers we have counts for

collaborators

7 papers

physics.comp-ph2019★ 12 cited

A semi-analytical approach for the characterization of ordered 3D nano structures using grazing-incidence X-ray fluorescence

K. V. Nikolaev, V. Soltwisch, P. Hoenicke +6

Following the recent demonstration of grazing-incidence X-ray fluorescence (GIXRF) based characterization of the 3D atomic distribution of different elements and dimensional parame…

cond-mat.mtrl-sci2018★ 1 cited

Limits of surface analysis of thin film compounds using LEIS

Andrey A. Zameshin, Andrey E. Yakshin, Jacobus M. Sturm +2

Low Energy Ion Scattering (LEIS) was employed to study the surface composition of thin films of Ru on B, C and B4C films at different stages of growth. Effects of surface segregati…

cond-mat.mtrl-sci2016

Tuning of large piezoelectric response in nanosheet-buffered lead zirconate titanate films on glass substrates

Anuj Chopra, Muharrem Bayraktar, Maarten Nijland +3

Renewed interest has been witnessed in utilizing the piezoelectric response of (PZT) films on glass substrates for applications such as data storage and…

physics.plasm-ph2014★ 10 cited

Plasma probe characteristics in low density hydrogen pulsed plasmas

D. I. Astakhov, W. J. Goedheer, C. J. Lee +6

Probe theories are only applicable in the regime where the probe's perturbation of the plasma can be neglected. However, it is not always possible to know, a priori, that a particu…

cond-mat.mtrl-sci2014

Extreme ultraviolet radiation induced defects in single-layer graphene

A. Gao, E. Zoethout, J. M. Sturm +2

We study extreme ultraviolet (EUV) radiation induced defects in single-layer graphene. Two mechanisms for inducing defects in graphene were separately investigated: photon induced…

physics.plasm-ph2013★ 47 cited

Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

A Dolgov, D Lopaev, T Rachimova +6

Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal…

physics.optics2011★ 5 cited

Ellipsometry with an undetermined polarization state

Feng Liu, Chris J. Lee, Juequan Chen +4

We show that, under the right conditions, one can make highly accurate polarization-based measurements without knowing the absolute polarization state of the probing light field. I…