14 citations · 23 across the 6 of their papers we have counts for
6 papers
Plasma double layer development during high power EUV exposure
Manis Chaudhuri, Pavel Krainov, Dmitry Astakhov +2
The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC…
Transient population dynamics of nanoparticles during pulsed EUV exposures
M. Chaudhuri, L. C. J. Heijmans, A. M. Yakunin +3
The transient population dynamics of charged (postive or negative) and neutral nanoparticles have been investigated in a pulsed Extreme Ultra-Violet (EUV) exposure environment with…
Particle charging during pulsed EUV exposures with afterglow effect
M. Chaudhuri, L. C. J. Heijmans, M. van de Kerkhof +3
The nanoparticle charging processes along with background spatial-temporal plasma profile have been investigated with 3DPIC simulation in a pulsed EUV exposure environment. It is f…
Dynamics of H atoms surface recombination in low-temperature plasma
V. Gubarev, D. Lopayev, A. Zotovich +5
The dynamics of H atom recombination on materials of interest for a EUV lithographer was studied under a longterm low-pressure H2 plasma exposure. The similarity of the experimenta…
Particle lofting from substrate exposed to plasma and electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from…
Dielectric particle lofting from dielectric substrate exposed to low energy electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low energy electron beam. The article dis…